The JANNuS-SCALP facility offers several experimental possibilities:
- ion deposit on substrates, and ion implantation and irradiation of solids, with a large energy range (5 eV – 11 MeV), a large diversity of ions available (from H to Bi), and a wide range of temperature (from liquid nitrogen up to 1000°C),
- ion beam analysis of materials, to obtain an elemental analysis vs. depth, and in particular RBS, channeling, ERDA, PIXE techniques, including in situ RBS-C with ion implantation,
- surface and topography analysis of materials using Scanning Electron Microscopy and Atomic Force Microscopy,
- in situ observation and analysis at the nanoscale of the evolution of the materials’ microstructure under single/dual ion irradiation, using in situ dual ion beam Transmission Electron Microscopy.